PTFE-SG+HL
NJbinglab
PTFE
Semiconductor Industry
Customization
-200℃ to +250℃
Strong Acid and Strong Alkali
Pure White
1pc
LOGO
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Product Description
This PTFE wafer cleaning tank with carrier is designed for semiconductor wafer cleaning processes where ultra-high purity and excellent chemical resistance are required. Made from high-purity PTFE, the system ensures outstanding corrosion resistance, low contamination risk, and long service life in harsh chemical environments.
The integrated PTFE wafer carrier allows wafers to be securely held during acid cleaning, rinsing, or chemical treatment, improving handling efficiency and reducing the risk of wafer damage.
High Purity PTFE Material – Excellent resistance to strong acids, alkalis, and aggressive chemicals used in semiconductor processing.
Low Contamination Risk – Non-metallic structure prevents metal ion contamination during wafer cleaning.
Integrated Wafer Carrier – Designed for stable wafer holding and easy transfer during cleaning processes.
Excellent Temperature Resistance – Suitable for high-temperature chemical cleaning applications.
Smooth Surface Finish – Reduces particle adhesion and ensures easy cleaning.
Customizable Design – Tank size, wafer capacity, and carrier structure can be customized according to wafer dimensions and process requirements.
Semiconductor wafer cleaning
Wet chemical processing
Acid and solvent cleaning procedures
Laboratory wafer preparation and research
Tank dimensions
Wafer carrier capacity and slot design
Handle structure and support base
Wall thickness and reinforcement design
Custom manufacturing is available to meet different wafer sizes and semiconductor process requirements.
