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  • 50ml PFA graduated cylinder with graduations
    50ml PFA graduated cylinder with graduations
    With Graduations: Clear graduations allow for precise liquid measurement. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Extreme Thermal Range: -200°C to +260°C Ultra-smooth Inner Wall No Residue at the Discharge Port
    Hot Tags : PFA graduated cylinder PFA
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  • 250ml PFA graduated cylinder with graduations
    250ml PFA graduated cylinder with graduations
    With Graduations: Clear graduations allow for precise liquid measurement. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Extreme Thermal Range: -200°C to +260°C Ultra-smooth Inner Wall No Residue at the Discharge Port
    Hot Tags : PFA graduated cylinder PFA
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  • 500ml PFA gas washing bottle with good sealing
    500ml PFA gas washing bottle with good sealing
    Superior Sealing: Precision-threaded PFA caps provide a liquid-tight, contamination-free seal without liners. Chemical Purity: Made from ultra-pure PFA, eliminating trace metal leaching for ppt-level. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Extreme Thermal Range: -200°C to +260°C. Color: Translucent.
    Hot Tags : PFA GAS WASH BOTTLE PFA
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  • 250ml PFA gas washing bottle with good sealing
    250ml PFA gas washing bottle with good sealing
    Superior Sealing: Precision-threaded PFA caps provide a liquid-tight, contamination-free seal without liners. Chemical Purity: Made from ultra-pure PFA, eliminating trace metal leaching for ppt-level. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Extreme Thermal Range: -200°C to +260°C. Color: Translucent.
    Hot Tags : PFA GAS WASH BOTTLE PFA
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  • PTFE wafer basket, for square wafer
    PTFE wafer basket, for square wafer
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • PTFE wafer cassette, for 2
    PTFE wafer cassette, for 2", 16 slots
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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  • PTFE wafer cassette, for 8
    PTFE wafer cassette, for 8", 5 slots, with Y type handle
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C without leaching contaminants. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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  • PTFE wafer cassette, for 6
    PTFE wafer cassette, for 6", 5 slots, with Y type handle
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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  • PTFE wafer cassette, for 4
    PTFE wafer cassette, for 4", 5 slots, with Y type handle
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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  • PTFE wafer cassette, for 3
    PTFE wafer cassette, for 3", 5 slots, with Y type handle
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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  • PTFE wafer cassette, for 140*140mm, 18 slots, Robot-arm compatible, with built-in hooks
    PTFE wafer cassette, for 140*140mm, 18 slots, Robot-arm compatible, with built-in hooks
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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  • PTFE wafer cassette, for 50*50mm, 25 slots, with handle
    PTFE wafer cassette, for 50*50mm, 25 slots, with handle
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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If you are interested in our products and want to know more details,please leave a message here,we will reply you as soon as we can.
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