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Wafer Process

  • High-Purity PTFE cleaning Tank,with Cover
    High-Purity PTFE cleaning Tank,with Cover
      Color: Pure white and opaque. Extreme Thermal Range: -200°C to +250°C. Chemical Resistance: Inert to concentrated HF, HNO3, and aggressive organic solvents. Chemical Purity: Made from ultra-pure PTFE, eliminating trace metal leaching for ppt-level. Ultra-smooth Surface: Non-stick interior ensures near-total sample recovery and effortless cleaning. Bespoke Configurations: Sizes, specifications, and capacities can be customized to meet specific application requirements.  
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  • 15L PFA cleaning tank with cover
    15L PFA cleaning tank with cover
    Extreme Purity: Extremely low trace metal leaching; safe for ppt-level cleanroom environments. Broad Temp Range: Maintains structural integrity from -200°C to +260°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Hydrophobic Surface: Non-stick and easy to decontaminate, preventing cross-sample contamination.
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  • 6'' PFA wafer dipper
    6'' PFA wafer dipper
    Secure Single-Wafer Holding: Designed to firmly hold one 6-inch wafer or a square plate, preventing slipping or misalignment during dipping processes. Ultra-Pure PTFE Construction: Made from pure PFA material, ensuring less metal ion leaching and compatibility with ultra-trace analysis environments. Excellent Chemical Resistance: Fully inert to aggressive acids such as HF, HNO₃, HCl, and organic solvents. Thermal Stability: Operates reliably across a wide temperature range (-200°C to +260°C), suitable for both ambient and heated chemical baths. User-Friendly Design: Ergonomic handle allows stable grip and precise control, enabling smooth insertion and removal of wafers without contamination. Non-Scratch Contact Structure:Carefully designed contact points minimize wafer surface damage while maintaining secure positioning.
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  • 6'' PTFE wafer dipper
    6'' PTFE wafer dipper
    Secure Single-Wafer Holding: Designed to firmly hold one 6-inch wafer or a square plate, preventing slipping or misalignment during dipping processes. Ultra-Pure PTFE Construction: Made from pure PTFE material, ensuring less metal ion leaching and compatibility with ultra-trace analysis environments. Excellent Chemical Resistance: Fully inert to aggressive acids such as HF, HNO₃, HCl, and organic solvents. Thermal Stability: Operates reliably across a wide temperature range (-200°C to +250°C), suitable for both ambient and heated chemical baths. User-Friendly Design: Ergonomic handle allows stable grip and precise control, enabling smooth insertion and removal of wafers without contamination. Non-Scratch Contact Structure:Carefully designed contact points minimize wafer surface damage while maintaining secure positioning.
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  • PTFE square silicon wafer box,25*25*3mm
    PTFE square silicon wafer box,25*25*3mm
    Ultra-High Purity PTFE Material:Prevents metal ion leaching and particle contamination, suitable for cleanroom and semiconductor-grade applications. Excellent Chemical Resistance:Compatible with strong acids (HF, HNO₃, HCl) and aggressive reagents used in wafer processing. Thermal Stability:Withstands temperatures from -200°C to +260°C without deformation. Precision Fit Design:Tailored internal dimensions ensure secure placement of 25×25×3 mm wafers, minimizing movement and damage. Smooth, Non-Stick Surface:Reduces particle adhesion and facilitates easy cleaning.
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  • 4'' PTFE single process wafer carrier
    4'' PTFE single process wafer carrier
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • PTFE square cleaning Tank, 600*400*400mm
    PTFE square cleaning Tank, 600*400*400mm
      Color: Pure white and opaque. Extreme Thermal Range: -200°C to +250°C. Chemical Resistance: Inert to concentrated HF, HNO3, and aggressive organic solvents. Chemical Purity: Made from ultra-pure PTFE, eliminating trace metal leaching for ppt-level. Ultra-smooth Surface: Non-stick interior ensures near-total sample recovery and effortless cleaning. Bespoke Configurations: Sizes, specifications, and capacities can be customized to meet specific application requirements.  
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  • PEEK Wafer Gripper, for 4
    PEEK Wafer Gripper, for 4" wafer
    Precision Individual Handling: Specifically engineered for the safe pick-and-place of single wafers, preventing cross-contamination and surface damage. Superior Mechanical Strength: Made from high-performance PEEK, providing the rigidity and "spring-back" memory required for consistent gripping force. High-Heat Resilience: Capable of handling wafers directly from high-temperature processes (up to 260°C) without softening or deforming. Non-Marring Contact: The smooth PEEK tips are designed to grip wafers by the edges or underside without scratching sensitive layers or leaving metallic traces. Ergonomic Slide-Lock Design: Features a built-in sliding mechanism (only for 4") to lock the gripper in place, ensuring a fatigue-free and secure hold during transport.
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  • PEEK Wafer Gripper, for 6
    PEEK Wafer Gripper, for 6" wafer
    Precision Individual Handling: Specifically engineered for the safe pick-and-place of single wafers, preventing cross-contamination and surface damage. Superior Mechanical Strength: Made from high-performance PEEK, providing the rigidity and "spring-back" memory required for consistent gripping force. High-Heat Resilience: Capable of handling wafers directly from high-temperature processes (up to 260°C) without softening or deforming. Non-Marring Contact: The smooth PEEK tips are designed to grip wafers by the edges or underside without scratching sensitive layers or leaving metallic traces. Ergonomic Slide-Lock Design: Features a built-in sliding mechanism (only for 6") to lock the gripper in place, ensuring a fatigue-free and secure hold during transport.
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  • PEEK Wafer Gripper, for 12
    PEEK Wafer Gripper, for 12" wafer
    Precision Individual Handling: Specifically engineered for the safe pick-and-place of single wafers, preventing cross-contamination and surface damage. Superior Mechanical Strength: Made from high-performance PEEK, providing the rigidity and "spring-back" memory required for consistent gripping force. High-Heat Resilience: Capable of handling wafers directly from high-temperature processes (up to 260°C) without softening or deforming. Non-Marring Contact: The smooth PEEK tips are designed to grip wafers by the edges or underside without scratching sensitive layers or leaving metallic traces. Ergonomic Slide-Lock Design: Features a built-in sliding mechanism (only for 12") to lock the gripper in place, ensuring a fatigue-free and secure hold during transport.
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  • PTFE process carrier for square wafer
    PTFE process carrier for square wafer
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 2'' PTFE process wafer carrier,16 slots
    2'' PTFE process wafer carrier,16 slots
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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