Semiconductor

PTFE round cleaning Tank with side handles
Color: Pure white and opaque. Extreme Thermal Range: -200°C to +250°C. Chemical Resistance: Inert to concentrated HF, HNO3, and aggressive organic solvents. Chemical Purity: Made from ultra-pure PTFE, eliminating trace metal leaching for ppt-level. Ultra-smooth Surface: Non-stick interior ensures near-total sample recovery and effortless cleaning. Bespoke Configurations: Sizes, specifications, and capacities can be customized to meet specific application requirements.

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High-Purity PTFE cleaning Tank with Cover
Color: Pure white and opaque. Extreme Thermal Range: -200°C to +250°C. Chemical Resistance: Inert to concentrated HF, HNO3, and aggressive organic solvents. Chemical Purity: Made from ultra-pure PTFE, eliminating trace metal leaching for ppt-level. Ultra-smooth Surface: Non-stick interior ensures near-total sample recovery and effortless cleaning. Bespoke Configurations: Sizes, specifications, and capacities can be customized to meet specific application requirements.

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15L PFA cleaning tank with cover
Extreme Purity: Extremely low trace metal leaching; safe for ppt-level cleanroom environments. Broad Temp Range: Maintains structural integrity from -200°C to +260°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Hydrophobic Surface: Non-stick and easy to decontaminate, preventing cross-sample contamination.
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90L PFA Chemical Cleaning Tank with Cover
High-purity PFA construction with excellent chemical resistance and low contamination risk Large 90L capacity suitable for batch cleaning and industrial-scale applications Compatible with strong acids, alkalis, and organic solvents Excellent corrosion resistance for long-term chemical processing PFA cover design to reduce particle and environmental contamination Customizable dimensions and configurations to meet specific process requirements

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PTFE Perforated Filter Basket,Made to Order
Designed for Cleanroom Cleaning – Ideal for soaking, rinsing and draining small laboratory vessels and components. High-Purity PTFE – Excellent chemical resistance and low surface adhesion. Perforated Design – Allows cleaning solutions to flow through efficiently and enables quick drainage. Made to Order – Customizable dimensions, hole size, perforation pattern and thickness. Flexible for Different Applications – Suitable for acid cleaning, laboratory ware cleaning and other wet-cleaning processes.

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PTFE wafer basket,5 slots
Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.

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Heavy-duty PTFE Carrier,Made to Order
Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.

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5*5cm PTFE Square Si Sample Process Carrier,10 slots
Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.

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PTFE Immersion Container for Wafer etching
Color: Pure white and opaque. Extreme Thermal Range: -200°C to +250°C. Chemical Resistance: Inert to concentrated HF, HNO3, and aggressive organic solvents. Chemical Purity: Made from ultra-pure PTFE, eliminating trace metal leaching for ppt-level. Ultra-smooth Surface: Non-stick interior ensures near-total sample recovery and effortless cleaning. Made to Order

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4'' PTFE Wafer etching Carrier,6 slots
Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.

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7cm PTFE single wafer carrier
Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.
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4cm PTFE single wafer carrier
Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.
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