Semiconductor

  Color: Pure white and opaque. Extreme Thermal Range: -200°C to +250°C. Chemical Resistance: Inert to concentrated HF, HNO3, and aggressive organic solvents. Chemical Purity: Made from ultra-pure PTFE, eliminating trace metal leaching for ppt-level. Ultra-smooth Surface: Non-stick interior ensures near-total sample recovery and effortless cleaning. Bespoke Configurations: Sizes, specifications, and capacities can be customized to meet specific application requirements.  

Extreme Purity: Extremely low trace metal leaching; safe for ppt-level cleanroom environments. Broad Temp Range: Maintains structural integrity from -200°C to +260°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Hydrophobic Surface: Non-stick and easy to decontaminate, preventing cross-sample contamination.

1. ESD-Safe MaterialMade from anti-static polypropylene with controlled surface resistivity, effectively preventing electrostatic discharge and protecting sensitive wafers during handling. 2. 25-Slot Precision DesignStandard 25-slot structure ensures consistent wafer spacing and stable positioning, reducing wafer contact, scratches, and edge damage. 3. Cleanroom CompatibilityLow particle generation, low outgassing, and excellent chemical compatibility make it ideal for semiconductor cleanroom processes such as wet cleaning, rinsing, and drying. 4. Excellent Mechanical StabilityReinforced structure prevents deformation during handling, transport, and spin processes, ensuring reliable wafer alignment. 5. Optimized Open StructureOpen sidewalls and bottom drainage design enhance liquid flow and drying efficiency during wet processing. 6. Automation CompatibilityDesigned to meet standard cassette dimensions, compatible with automated wafer handling systems and equipment.  

Extreme Purity: Extremely low trace metal leaching; safe for ppt-level cleanroom environments. Broad Temp Range: Maintains structural integrity from -200°C to +260°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Hydrophobic Surface: Non-stick and easy to decontaminate, preventing cross-sample contamination. By drilling small, uniformly sized holes into the cleaning tank, it can be used for filtration.

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +205°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +205°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +205°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +205°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +260°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +260°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +260°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

PFA pleated filter cartridge is constructed entirely from fluoropolymer materials, featuring a PTFE membrane combined with a PFA support and flow structure.It is designed for ultra-high purity and aggressive chemical filtration applications.   With excellent chemical resistance, the cartridge is suitable for filtration of strong acids, alkalis, and a wide range of organic solvents.It provides reliable performance in ultra-clean and highly corrosive process environments.