Semiconductor Purity: Fabricated from high-purity PFA to eliminate metal ion leaching and particle shedding.
Thermal Endurance: Engineered to withstand aggressive chemical baths at temperatures up to +260°C.
Universal Resistance: Fully inert to concentrated HF, H2SO4, and ultra-pure etching solutions.
Precision Geometry: Designed with specialized slots for maximum fluid circulation and secure wafer/substrate support.
Ergonomic Handling: Compatible with interchangeable PFA handles for safe, contamination-free transport in cleanrooms.
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