Semiconductor

PFA 3-way fitting, 8mm OD tube ports
Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Chemical Purity: Made from ultra-pure FEP, eliminating trace metal leaching for ppt-level. Extreme Thermal Range: -200°C to +260°C Zero-Leak Connection: Precision-engineered threads ensure seal. Non-Stick Surface: Resists particle accumulation and "dead zones," maintaining high-flow system hygiene.

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1/4 inch PFA tubing
Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +260°C Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

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6'' PFA wafer dipper
Secure Single-Wafer Holding: Designed to firmly hold one 6-inch wafer or a square plate, preventing slipping or misalignment during dipping processes. Ultra-Pure PTFE Construction: Made from pure PFA material, ensuring less metal ion leaching and compatibility with ultra-trace analysis environments. Excellent Chemical Resistance: Fully inert to aggressive acids such as HF, HNO₃, HCl, and organic solvents. Thermal Stability: Operates reliably across a wide temperature range (-200°C to +260°C), suitable for both ambient and heated chemical baths. User-Friendly Design: Ergonomic handle allows stable grip and precise control, enabling smooth insertion and removal of wafers without contamination. Non-Scratch Contact Structure:Carefully designed contact points minimize wafer surface damage while maintaining secure positioning.

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6'' PTFE wafer dipper
Secure Single-Wafer Holding: Designed to firmly hold one 6-inch wafer or a square plate, preventing slipping or misalignment during dipping processes. Ultra-Pure PTFE Construction: Made from pure PTFE material, ensuring less metal ion leaching and compatibility with ultra-trace analysis environments. Excellent Chemical Resistance: Fully inert to aggressive acids such as HF, HNO₃, HCl, and organic solvents. Thermal Stability: Operates reliably across a wide temperature range (-200°C to +250°C), suitable for both ambient and heated chemical baths. User-Friendly Design: Ergonomic handle allows stable grip and precise control, enabling smooth insertion and removal of wafers without contamination. Non-Scratch Contact Structure:Carefully designed contact points minimize wafer surface damage while maintaining secure positioning.

Hot Tags : PTFE wafer dipper 6 inch wafer holder semiconductor wafer handling acid resistant wafer holder cleanroom wafer tool PFA/PTFE labware
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PTFE square silicon wafer box,25*25*3mm
Ultra-High Purity PTFE Material：Prevents metal ion leaching and particle contamination, suitable for cleanroom and semiconductor-grade applications. Excellent Chemical Resistance：Compatible with strong acids (HF, HNO₃, HCl) and aggressive reagents used in wafer processing. Thermal Stability：Withstands temperatures from -200°C to +260°C without deformation. Precision Fit Design：Tailored internal dimensions ensure secure placement of 25×25×3 mm wafers, minimizing movement and damage. Smooth, Non-Stick Surface：Reduces particle adhesion and facilitates easy cleaning.

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4'' PTFE single process wafer carrier
Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.

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PTFE square cleaning Tank, 600*400*400mm
Color: Pure white and opaque. Extreme Thermal Range: -200°C to +250°C. Chemical Resistance: Inert to concentrated HF, HNO3, and aggressive organic solvents. Chemical Purity: Made from ultra-pure PTFE, eliminating trace metal leaching for ppt-level. Ultra-smooth Surface: Non-stick interior ensures near-total sample recovery and effortless cleaning. Bespoke Configurations: Sizes, specifications, and capacities can be customized to meet specific application requirements.

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PTFE process carrier for square wafer
Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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2'' PTFE process wafer carrier,16 slots
Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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8'' PTFE wafer cassette with Y type handle,5 slots
Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C without leaching contaminants. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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6'' PTFE transport wafer cassette with handle
Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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4" PTFE wafer carrier with Y type handle, 5 slots
Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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