Semiconductor

Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.

Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.

PTFE Filter Lid Made to order

Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.

Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.

Chemical Resistance: Inert to concentrated HF, HNO3, and aggressive organic solvents. Chemical Purity: Made from ultra-pure PTFE, eliminating trace metal leaching for ppt-level. Extreme Thermal Range: -200°C to +250°C Ultra-smooth Surface: Non-stick interior ensures near-total sample recovery and effortless cleaning. Color: Pure white and opaque Made to Order    

PTFE gas connector, compatible with standard laboratory ports #24, #29. Made to order

1. ESD-Safe MaterialMade from anti-static polypropylene with controlled surface resistivity, effectively preventing electrostatic discharge and protecting sensitive wafers during handling. 2. 25-Slot Precision DesignStandard 25-slot structure ensures consistent wafer spacing and stable positioning, reducing wafer contact, scratches, and edge damage. 3. Cleanroom CompatibilityLow particle generation, low outgassing, and excellent chemical compatibility make it ideal for semiconductor cleanroom processes such as wet cleaning, rinsing, and drying. 4. Excellent Mechanical StabilityReinforced structure prevents deformation during handling, transport, and spin processes, ensuring reliable wafer alignment. 5. Optimized Open StructureOpen sidewalls and bottom drainage design enhance liquid flow and drying efficiency during wet processing. 6. Automation CompatibilityDesigned to meet standard cassette dimensions, compatible with automated wafer handling systems and equipment.  

Extreme Purity: Extremely low trace metal leaching; safe for ppt-level cleanroom environments. Broad Temp Range: Maintains structural integrity from -200°C to +260°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Hydrophobic Surface: Non-stick and easy to decontaminate, preventing cross-sample contamination. By drilling small, uniformly sized holes into the cleaning tank, it can be used for filtration.

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +205°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +205°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments

Super corrosion resistance: Can withstand almost all strong acids, alkalis and organic solvents (including HF, aqua regia, etc.) Wide temperature range: -200°C ~ +205°C  Extremely low precipitation and adsorption: Suitable for high-purity and trace analysis experiments Excellent transparency: Easy to observe the fluid state Good flexibility: Easier to bend and install than PTFE High-purity grade materials: Suitable for semiconductors and ultra-clean environments