Ultra-High Purity PTFE Material：Prevents metal ion leaching and particle contamination, suitable for cleanroom and semiconductor-grade applications.
Excellent Chemical Resistance：Compatible with strong acids (HF, HNO₃, HCl) and aggressive reagents used in wafer processing.
Thermal Stability：Withstands temperatures from -200°C to +260°C without deformation.
Precision Fit Design：Tailored internal dimensions ensure secure placement of 25×25×3 mm wafers, minimizing movement and damage.
Smooth, Non-Stick Surface：Reduces particle adhesion and facilitates easy cleaning.
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