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Wafer Handling

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Wafer Handling

  • 8'' PTFE wafer transport carrier,13 slots
    8'' PTFE wafer transport carrier,13 slots
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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  • 6'' PFA wafer dipper
    6'' PFA wafer dipper
    Secure Single-Wafer Holding: Designed to firmly hold one 6-inch wafer or a square plate, preventing slipping or misalignment during dipping processes. Ultra-Pure PTFE Construction: Made from pure PFA material, ensuring less metal ion leaching and compatibility with ultra-trace analysis environments. Excellent Chemical Resistance: Fully inert to aggressive acids such as HF, HNO₃, HCl, and organic solvents. Thermal Stability: Operates reliably across a wide temperature range (-200°C to +260°C), suitable for both ambient and heated chemical baths. User-Friendly Design: Ergonomic handle allows stable grip and precise control, enabling smooth insertion and removal of wafers without contamination. Non-Scratch Contact Structure:Carefully designed contact points minimize wafer surface damage while maintaining secure positioning.
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  • 6'' PTFE wafer dipper
    6'' PTFE wafer dipper
    Secure Single-Wafer Holding: Designed to firmly hold one 6-inch wafer or a square plate, preventing slipping or misalignment during dipping processes. Ultra-Pure PTFE Construction: Made from pure PTFE material, ensuring less metal ion leaching and compatibility with ultra-trace analysis environments. Excellent Chemical Resistance: Fully inert to aggressive acids such as HF, HNO₃, HCl, and organic solvents. Thermal Stability: Operates reliably across a wide temperature range (-200°C to +250°C), suitable for both ambient and heated chemical baths. User-Friendly Design: Ergonomic handle allows stable grip and precise control, enabling smooth insertion and removal of wafers without contamination. Non-Scratch Contact Structure:Carefully designed contact points minimize wafer surface damage while maintaining secure positioning.
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  • 4'' PTFE single process wafer carrier
    4'' PTFE single process wafer carrier
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 8'' PTFE single wafer transportation carrier
    8'' PTFE single wafer transportation carrier
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.
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