Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch).
Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing.
Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing.
Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C.
Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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