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Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths.
Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform to hold wafers securely with minimal surface contact.
Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate.
100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4.
Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
Brand :
NJbinglabItem No :
PTFE-HL-SWmaterial :
PTFESpecification :
for square waferThis specialized PTFE Wafer Basket is engineered for precision cleaning and etching of individual substrates or small batches. Unlike large-scale carriers, this compact, vertical-handle design allows operators to maintain maximum control during delicate dipping processes. The pure white PTFE construction ensures a "metal-free" environment, preventing the leaching of impurities that could compromise semiconductor electrical properties. Whether you are using the slotted rectangular base for edge-only contact or the perforated circular base for optimized fluid turbulence, these baskets provide a stable and non-reactive housing for high-value wafers.
We specialize in tailoring these baskets to your specific wet-bench requirements:
Custom Base Styles: Choose between a slotted V-bridge (for minimum contact) or a perforated disk (for maximum stability).
Adjustable Handle Length: Handles can be extended or shortened to match the liquid levels of your specific PFA or PTFE cleaning tanks.
Tailored Wafer Fit: Precision-sized for standard 1-inch to 8-inch wafers, or customized for square substrates and optical components.
Multi-Slot Expansion: The base can be modified to hold multiple wafers in a parallel or back-to-back configuration.
Designed to integrate into a professional high-purity cleaning station:
PFA/PTFE Cleaning Tanks: The vertical handle design is optimized for use in deep, narrow-mouth cleaning jars and tanks.
Inert Hot Plates: Ideal for processes requiring heated chemical baths, as the PTFE material remains stable up to 260°C.
PTFE Tweezers: Used for the precise placement and removal of wafers from the basket slots without scratching the surface.
PFA Fittings & Tubing: Essential for constructing the ultra-pure water (UPW) rinsing lines used after the chemical etch.
R&D Laboratory Scale: Ideal for university research and small-scale pilot lines where individual wafer processing is required.
Semiconductor Wet Etching: Safe handling during hydrofluoric acid (HF) dipping or buffered oxide etch (BOE) steps.
MEMS & Micro-Optics: Processing of specialized sensors, sapphire windows, and quartz substrates.
Thin-Film Deposition Prep: Ensuring a pristine, particle-free surface prior to CVD or PVD processes.
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