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Wafer Process

  • 4'' PTFE mask cleaning basket,1-5 positions
    4'' PTFE mask cleaning basket,1-5 positions
    Chemical-Inert Armor: Fabricated from 100% high-purity PTFE, providing total resistance to aggressive lithography chemicals, including Piranha etch (H2SO4/H2O2), developers, and organic solvents. Precision-Slotted Design: Features CNC-machined grooves that secure masks by the edges, ensuring zero contact with the critical patterned surface. Maximized Fluid Dynamics: The open-frame architecture allows for high-velocity chemical flow and rapid, bubble-free rinsing across the entire mask face. Superior Surface Finish: The ultra-smooth, non-stick PTFE surface prevents particle entrapment and eliminates the risk of scratching sensitive quartz or glass substrates. Fully Customizable Architecture: Slot pitch, pocket depth, and overall dimensions can be bespoke-tailored to fit any mask size (e.g., 4", 5", 6", 7" or custom reticles).
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  • 2*2cm PTFE process silicon wafer basket, 1-5 slots
    2*2cm PTFE process silicon wafer basket, 1-5 slots
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 6'' PTFE wafer process basket,1-5 slots
    6'' PTFE wafer process basket,1-5 slots
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 4'' PTFE process wafer carrier with T-bar,1-5 slots
    4'' PTFE process wafer carrier with T-bar,1-5 slots
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 4'' PTFE wafer transport carrier, 1-5 slots
    4'' PTFE wafer transport carrier, 1-5 slots
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 8'' PTFE single process wafer basket
    8'' PTFE single process wafer basket
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 4'' single PTFE process wafer basket
    4'' single PTFE process wafer basket
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 2'' PTFE single process wafer carrier
    2'' PTFE single process wafer carrier
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 3'' Y type PFA handle of  wafer carrier
    3'' Y type PFA handle of wafer carrier
    Ultra-Pure Construction: Fabricated from 100% high-purity PFA to prevent metal ion leaching during submersion. Extreme Chemical Resistance: Fully inert to concentrated HF, hot H2SO4, and aggressive etchants. Thermal Resilience: Maintains structural strength and grip integrity at temperatures up to +260°C. Ergonomic & Secure: Precision-molded to snap firmly onto cassettes, ensuring a slip-free connection. Contamination-Free: Non-stick, hydrophobic surface allows for rapid rinsing and zero particle retention.
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  • 6'' M type PFA handle of wafer cassette
    6'' M type PFA handle of wafer cassette
    Ultra-Pure Construction: Fabricated from 100% high-purity PFA to prevent metal ion leaching during submersion. Extreme Chemical Resistance: Fully inert to concentrated HF, hot H2SO4, and aggressive etchants. Thermal Resilience: Maintains structural strength and grip integrity at temperatures up to +260°C. Ergonomic & Secure: Precision-molded to snap firmly onto cassettes, ensuring a slip-free connection. Contamination-Free: Non-stick, hydrophobic surface allows for rapid rinsing and zero particle retention.
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  • 4'' M type PFA handle of wafer carrier
    4'' M type PFA handle of wafer carrier
    Ultra-Pure Construction: Fabricated from 100% high-purity PFA to prevent metal ion leaching during submersion. Extreme Chemical Resistance: Fully inert to concentrated HF, hot H2SO4, and aggressive etchants. Thermal Resilience: Maintains structural strength and grip integrity at temperatures up to +260°C. Ergonomic & Secure: Precision-molded to snap firmly onto cassettes, ensuring a slip-free connection. Contamination-Free: Non-stick, hydrophobic surface allows for rapid rinsing and zero particle retention.
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  • 6'' PFA wafer transport cassette,25 slots
    6'' PFA wafer transport cassette,25 slots
    Semiconductor Purity: Fabricated from high-purity PFA to eliminate metal ion leaching and particle shedding. Thermal Endurance: Engineered to withstand aggressive chemical baths at temperatures up to +260°C. Universal Resistance: Fully inert to concentrated HF, H2SO4, and ultra-pure etching solutions. Precision Geometry: Designed with specialized slots for maximum fluid circulation and secure wafer/substrate support. Ergonomic Handling: Compatible with interchangeable PFA handles for safe, contamination-free transport in cleanrooms.
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If you are interested in our products and want to know more details,please leave a message here,we will reply you as soon as we can.
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