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  • Graphite Inert hot plate 400*300mm
    Graphite Inert hot plate 400*300mm
    Advanced Corrosion Protection: High-grade aluminum alloy body with a specialized PFA anti-corrosion coating. Precise Thermal Range: Reliable and uniform heating with a maximum operating temperature of 220°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Superior Uniformity: Aluminum core ensures rapid heat transfer and excellent temperature consistency across the entire plate. Cleanroom Compatible: Minimal particle shedding and easy-to-clean surface, ideal for trace analysis workflows.
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  • Inert hot plate 600*400mm
    Inert hot plate 600*400mm
    Advanced Corrosion Protection: High-grade aluminum alloy body with a specialized PFA anti-corrosion coating. Precise Thermal Range: Reliable and uniform heating with a maximum operating temperature of 220°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Superior Uniformity: Aluminum core ensures rapid heat transfer and excellent temperature consistency across the entire plate. Cleanroom Compatible: Minimal particle shedding and easy-to-clean surface, ideal for trace analysis workflows.
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  • PFA shovel 197* 110* 60mm
    PFA shovel 197* 110* 60mm
    Exceptional Purity: Fabricated from high-purity PFA to eliminate trace metal contamination during solids handling. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Extreme Thermal Range: -200°C to +260°C Ultra-Smooth Surface: Non-stick, hydrophobic finish ensures complete sample release and effortless cleaning. Durable & Unbreakable: A rugged, corrosion-proof alternative to stainless steel or glass tools in harsh environments.
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  • 3'' Y type PFA handle of  wafer carrier
    3'' Y type PFA handle of wafer carrier
    Ultra-Pure Construction: Fabricated from 100% high-purity PFA to prevent metal ion leaching during submersion. Extreme Chemical Resistance: Fully inert to concentrated HF, hot H2SO4, and aggressive etchants. Thermal Resilience: Maintains structural strength and grip integrity at temperatures up to +260°C. Ergonomic & Secure: Precision-molded to snap firmly onto cassettes, ensuring a slip-free connection. Contamination-Free: Non-stick, hydrophobic surface allows for rapid rinsing and zero particle retention.
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  • 6'' M type PFA handle of wafer cassette
    6'' M type PFA handle of wafer cassette
    Ultra-Pure Construction: Fabricated from 100% high-purity PFA to prevent metal ion leaching during submersion. Extreme Chemical Resistance: Fully inert to concentrated HF, hot H2SO4, and aggressive etchants. Thermal Resilience: Maintains structural strength and grip integrity at temperatures up to +260°C. Ergonomic & Secure: Precision-molded to snap firmly onto cassettes, ensuring a slip-free connection. Contamination-Free: Non-stick, hydrophobic surface allows for rapid rinsing and zero particle retention.
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  • 4'' M type PFA handle of wafer carrier
    4'' M type PFA handle of wafer carrier
    Ultra-Pure Construction: Fabricated from 100% high-purity PFA to prevent metal ion leaching during submersion. Extreme Chemical Resistance: Fully inert to concentrated HF, hot H2SO4, and aggressive etchants. Thermal Resilience: Maintains structural strength and grip integrity at temperatures up to +260°C. Ergonomic & Secure: Precision-molded to snap firmly onto cassettes, ensuring a slip-free connection. Contamination-Free: Non-stick, hydrophobic surface allows for rapid rinsing and zero particle retention.
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  • 6'' PFA wafer transport cassette,25 slots
    6'' PFA wafer transport cassette,25 slots
    Semiconductor Purity: Fabricated from high-purity PFA to eliminate metal ion leaching and particle shedding. Thermal Endurance: Engineered to withstand aggressive chemical baths at temperatures up to +260°C. Universal Resistance: Fully inert to concentrated HF, H2SO4, and ultra-pure etching solutions. Precision Geometry: Designed with specialized slots for maximum fluid circulation and secure wafer/substrate support. Ergonomic Handling: Compatible with interchangeable PFA handles for safe, contamination-free transport in cleanrooms.
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  • 4'' PFA process wafer carriers, 25 slots
    4'' PFA process wafer carriers, 25 slots
    Semiconductor Purity: Fabricated from high-purity PFA to eliminate metal ion leaching and particle shedding. Thermal Endurance: Engineered to withstand aggressive chemical baths at temperatures up to +260°C. Universal Resistance: Fully inert to concentrated HF, H2SO4, and ultra-pure etching solutions. Precision Geometry: Designed with specialized slots for maximum fluid circulation and secure wafer/substrate support. Ergonomic Handling: Compatible with interchangeable PFA handles for safe, contamination-free transport in cleanrooms.
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  • 20ml PFA test tube with screw cap
    20ml PFA test tube with screw cap
    Extreme Purity: Lowest metal ion background; essential for ppt-level trace analysis and ICP-MS prep. Superior Temp Stability: Operates reliably from -200°C to +260°C; suitable for heating and cryogenic storage. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Hydrophobic Surface: Ultra-smooth, non-stick interior ensures total sample recovery and prevents carryover. Exceptional Durability: Translucent, unbreakable construction provides a safer alternative to quartz or glass.
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  • 20ml PFA test tube
    20ml PFA test tube
    Extreme Purity: Lowest metal ion background; essential for ppt-level trace analysis and ICP-MS prep. Superior Temp Stability: Operates reliably from -200°C to +260°C; suitable for heating and cryogenic storage. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Hydrophobic Surface: Ultra-smooth, non-stick interior ensures total sample recovery and prevents carryover. Exceptional Durability: Translucent, unbreakable construction provides a safer alternative to quartz or glass.
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  • PFA cleaning tank 400*300*120mm
    PFA cleaning tank 400*300*120mm
    Extreme Purity: Extremely low trace metal leaching; safe for ppt-level cleanroom environments. Broad Temp Range: Maintains structural integrity from -200°C to +260°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Hydrophobic Surface: Non-stick and easy to decontaminate, preventing cross-sample contamination. Heavy-Duty Build: Robust, thick-walled design for secure handling of high-value labware and reagents.
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  • 3L PFA cleaning tank with cover
    3L PFA cleaning tank with cover
    Extreme Purity: Extremely low trace metal leaching; safe for ppt-level cleanroom environments. Broad Temp Range: Maintains structural integrity from -200°C to +260°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Hydrophobic Surface: Non-stick and easy to decontaminate, preventing cross-sample contamination.
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