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  • 8
    8" PTFE process wafer carrier,25 slots
    Exceptional Chemical Inertness: Fabricated from 100% high-purity PTFE, providing total resistance to concentrated HF, H2SO4, and BOE (Buffered Oxide Etch). Optimized Fluid Dynamics: Engineered with precision-milled slots and an open-frame design to ensure maximum chemical circulation and uniform rinsing. Surface Protection: The ultra-smooth, non-stick PTFE surface prevents wafer scratching and minimizes particle adhesion during processing. Thermal Stability: Maintains structural integrity in high-temperature chemical baths up to 250°C. Bespoke Customization: Fully tailorable slot pitch, pocket depth, and overall dimensions to accommodate any wafer size (2", 4", 6", 8") or non-standard substrate.
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  • 5'' PTFE mask cleaning basket,1-5 positions
    5'' PTFE mask cleaning basket,1-5 positions
    Chemical-Inert Armor: Fabricated from 100% high-purity PTFE, providing total resistance to aggressive lithography chemicals, including Piranha etch (H2SO4/H2O2), developers, and organic solvents. Precision-Slotted Design: Features CNC-machined grooves that secure masks by the edges, ensuring zero contact with the critical patterned surface. Maximized Fluid Dynamics: The open-frame architecture allows for high-velocity chemical flow and rapid, bubble-free rinsing across the entire mask face. Superior Surface Finish: The ultra-smooth, non-stick PTFE surface prevents particle entrapment and eliminates the risk of scratching sensitive quartz or glass substrates. Fully Customizable Architecture: Slot pitch, pocket depth, and overall dimensions can be bespoke-tailored to fit any mask size.
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  • 4'' PTFE mask cleaning basket,1-5 positions
    4'' PTFE mask cleaning basket,1-5 positions
    Chemical-Inert Armor: Fabricated from 100% high-purity PTFE, providing total resistance to aggressive lithography chemicals, including Piranha etch (H2SO4/H2O2), developers, and organic solvents. Precision-Slotted Design: Features CNC-machined grooves that secure masks by the edges, ensuring zero contact with the critical patterned surface. Maximized Fluid Dynamics: The open-frame architecture allows for high-velocity chemical flow and rapid, bubble-free rinsing across the entire mask face. Superior Surface Finish: The ultra-smooth, non-stick PTFE surface prevents particle entrapment and eliminates the risk of scratching sensitive quartz or glass substrates. Fully Customizable Architecture: Slot pitch, pocket depth, and overall dimensions can be bespoke-tailored to fit any mask size (e.g., 4", 5", 6", 7" or custom reticles).
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  • 2*2cm PTFE process silicon wafer basket, 1-5 slots
    2*2cm PTFE process silicon wafer basket, 1-5 slots
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 6'' PTFE wafer process basket,1-5 slots
    6'' PTFE wafer process basket,1-5 slots
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 4'' PTFE process wafer carrier with T-bar,1-5 slots
    4'' PTFE process wafer carrier with T-bar,1-5 slots
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 4'' PTFE wafer transport carrier, 1-5 slots
    4'' PTFE wafer transport carrier, 1-5 slots
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 8'' PTFE single process wafer basket
    8'' PTFE single process wafer basket
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 4'' single PTFE process wafer basket
    4'' single PTFE process wafer basket
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 2'' PTFE single process wafer carrier
    2'' PTFE single process wafer carrier
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • PTFE Filter Holder, clamp-lock type, for OD 90mm Membrane
    PTFE Filter Holder, clamp-lock type, for OD 90mm Membrane
    Ultra-Pure Filtration Path: Constructed from 100% high-purity PTFE to ensure zero metal ion leaching and no silica contamination. Enhanced O-Ring Sealing: Equipped with high-performance O-rings (FKM, FFKM, or PFA/FEP Encapsulated) to ensure a vacuum-tight and leak-proof seal. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Precision Membrane Support: Engineered to provide uniform pressure across the filter membrane, preventing bypass and ensuring consistent results. Fully Customizable Sizing: Precision-manufactured to accommodate any membrane diameter with bespoke connector options.
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  • PTFE Filter Holder, OD 90mm Membrane
    PTFE Filter Holder, OD 90mm Membrane
    Ultra-Pure Filtration Path: Constructed from 100% high-purity PTFE to ensure zero metal ion leaching and no silica contamination. Enhanced O-Ring Sealing: Equipped with high-performance O-rings (FKM, FFKM, or PFA/FEP Encapsulated) to ensure a vacuum-tight and leak-proof seal. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Precision Membrane Support: Engineered to provide uniform pressure across the filter membrane, preventing bypass and ensuring consistent results. Fully Customizable Sizing: Precision-manufactured to accommodate any membrane diameter with bespoke connector options.
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