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  • 4'' PTFE wafer transport carrier, 1-5 slots
    4'' PTFE wafer transport carrier, 1-5 slots
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 8'' PTFE single wafer transportation carrier
    8'' PTFE single wafer transportation carrier
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths and quantities, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 4'' single PTFE process wafer basket
    4'' single PTFE process wafer basket
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 2'' PTFE single process wafer carrier
    2'' PTFE single process wafer carrier
    Vertical Integrated Handle: Features a robust, upright PTFE handle for safe, manual immersion and retrieval from deep chemical baths. Precision-Slot Base: Designed with CNC-machined grooves or a perforated circular platform  to hold wafers securely with minimal surface contact. Maximum Chemical Circulation: The open-frame and multi-hole base design ensures rapid etchant flow and thorough rinsing of the substrate. 100% High-Purity PTFE: Offers total immunity to aggressive semiconductor chemicals including HF, BOE, and hot H3PO4. Bespoke Geometry: Fully customizable base diameters, slot widths, and handle lengths to accommodate specific wafer sizes or tank depths.
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  • 150ml PTFE Constant-Pressure Dropping Funnel
    150ml PTFE Constant-Pressure Dropping Funnel
    Hybrid Material Performance: All-PTFE body (extreme chem. resistance); PFA equalizer tube. Constant-Pressure Flow: PFA equalizer arm ensures consistent drip rate in sealed/pressurized systems. Heavy-Duty Stopcock: Robust PTFE stopcock ensures reliable on/off control and leak-proof performance. Chemical Resistance: Resistant to all major acids (including HF), bases, and solvents and can replace glass funnel. Specialized Volume Range: Available in standardized capacities from 50ml to 1000ml, optimized for precision laboratory scale.
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  • PFA-Coated Heating Rack 300*200mm for 7ml vials
    PFA-Coated Heating Rack 300*200mm for 7ml vials
    Enhanced Thermal Transfer: Custom-machined wells provide 360° contact around PFA vials, significantly reducing heating times compared to flat-surface contact. Corrosion-Proof Armor: High-grade graphite body encapsulated in a thick PFA coating for total protection against concentrated acid fumes. Superior Uniformity: The high-thermal-conductivity core ensures every sample position maintains an identical temperature profile. Customizable Geometry: Hole count, diameter, and depth can be precisely tailored to match your specific 15ml, 22ml, or 30ml PFA vial dimensions. High Temperature Stability: Fully compatible with inert hot plates operating at temperatures up to 220°C.
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  • Aluminum Alloy hot plate 400*300mm
    Aluminum Alloy hot plate 400*300mm
    High-Performance Heating: Optimized for high-intensity applications with a maximum temperature of 350°C. Rapid Thermal Conductivity: Industrial-grade aluminum alloy ensures extremely fast heat-up times and high efficiency. Exceptional Surface Flatness: CNC-machined surface provides optimal contact for vials, beakers, and specialized containers. Rugged & Durable: The uncoated metallic surface is resistant to scratching, mechanical impact, and thermal cycling. Uniform Heat Distribution: Advanced internal heating element configuration eliminates cold spots across the entire plate.
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  • High-Temperature Graphite hot plate 600* 400mm
    High-Temperature Graphite hot plate 600* 400mm
    Extended Thermal Range: Engineered for high-temperature workflows with a maximum operating limit of 350°C. Rapid Heat Transfer: High-purity isostatic graphite provides ultra-fast heating and cooling response times. Superior Surface Flatness: Precision-machined face ensures maximum contact and heat conduction for all vessels. Excellent Uniformity: Exceptional graphite conductivity eliminates thermal gradients across the entire heating area. Heavy-Duty Durability: Robust, uncoated surface is resistant to thermal shock and mechanical wear in high-load environments.
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  • Graphite Inert hot plate 400*300mm
    Graphite Inert hot plate 400*300mm
    Advanced Corrosion Protection: High-grade Graphite body with a specialized PFA anti-corrosion coating. Precise Thermal Range: Reliable and uniform heating with a maximum operating temperature of 220°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Superior Uniformity: Aluminum core ensures rapid heat transfer and excellent temperature consistency across the entire plate. Cleanroom Compatible: Minimal particle shedding and easy-to-clean surface, ideal for trace analysis workflows.
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  • Inert hot plate 600*400mm
    Inert hot plate 600*400mm
    Advanced Corrosion Protection: High-grade aluminum alloy body with a specialized PFA anti-corrosion coating. Precise Thermal Range: Reliable and uniform heating with a maximum operating temperature of 220°C. Chemical Resistance: Fully inert to concentrated HF, HNO3, and aggressive organic solvents. Superior Uniformity: Aluminum core ensures rapid heat transfer and excellent temperature consistency across the entire plate. Cleanroom Compatible: Minimal particle shedding and easy-to-clean surface, ideal for trace analysis workflows.
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  • 3'' Y type PFA handle of  wafer carrier
    3'' Y type PFA handle of wafer carrier
    Ultra-Pure Construction: Fabricated from 100% high-purity PFA to prevent metal ion leaching during submersion. Extreme Chemical Resistance: Fully inert to concentrated HF, hot H2SO4, and aggressive etchants. Thermal Resilience: Maintains structural strength and grip integrity at temperatures up to +260°C. Ergonomic & Secure: Precision-molded to snap firmly onto cassettes, ensuring a slip-free connection. Contamination-Free: Non-stick, hydrophobic surface allows for rapid rinsing and zero particle retention.
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  • 6'' M type PFA handle of wafer cassette
    6'' M type PFA handle of wafer cassette
    Ultra-Pure Construction: Fabricated from 100% high-purity PFA to prevent metal ion leaching during submersion. Extreme Chemical Resistance: Fully inert to concentrated HF, hot H2SO4, and aggressive etchants. Thermal Resilience: Maintains structural strength and grip integrity at temperatures up to +260°C. Ergonomic & Secure: Precision-molded to snap firmly onto cassettes, ensuring a slip-free connection. Contamination-Free: Non-stick, hydrophobic surface allows for rapid rinsing and zero particle retention.
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